MX 102-6

High-resolution thickness and flatness (TTV) gauge for 100–150 mm silicon wafers.

Easy adaption to different thickness ranges within a few seconds. Integration into automatic robotic sorter systems possible. The MX102-6 is ideally suited for research & development, qualification of processes, and process control of thickness and flatness (TTV). A pair of capacitive sensors samples four radial profiles (45 degrees) on every wafer. One such profile consists of 200 local thickness values and is offset by 45 degrees relative to the neighbouring profile. Comes with our powerful MX-NT operating software.


Measurement types

Thickness Flatness (TTV)

Features

Wafer Diameter 100 mm, 125 mm, 150 mm
Thickness accurancy ±0.4 µm
Resolution 10 nm
Spatial resolution 1 mm
Scans 4
Software MX-NT

Product comparison

Feature MX 102-6 MX 102-8 MX 1012 MX 1018
Wafer Diameter 100 mm, 125 mm, 150 mm 150 mm, 200 mm 200 mm, 300 mm 450 mm
Software MX-NT MX-NT MX-NT MX-NT
Scans 4 4 up to 8 up to 8
Spatial resolution 1 mm 1 mm 1 mm 1 mm
Resolution 10 nm 10 nm 10 nm 10 nm
Thickness accurancy ±0.4 µm ±0.4 µm ±0.4 µm ±0.3 µm

WHICH TOOL
fits my needs?

You have questions, wishes or an order?
We will be happy to consult you personally.

E+H Metrology is committed to protecting and respecting your privacy. We only use your personal information to administer your account and to provide the products and services you have requested.

Peter Michel

+49 (0)721 83118-17
sales(at)eh-metrology.com

 

Scroll down for more