MX 2012-H

Fast chip production geometry gauge for 300 mm silicon wafers.

The MX2012-H works as manually loaded stand-alone station with a throughput of at least 50 wafers per hour. With its 69 sensor pairs it controls thickness, bow and warp in high resolution. Wafer stress evaluation is optionally available. System can be converted for 200mm wafer measuring. Comes with our powerful MX-NT operating software.


Measurement types

Thickness Flatness (TTV) Bow Warp

Features

Wafer Diameter 300 mm
Thickness accurancy ±0.5 µm
Resolution 50 nm
Thickness range 500–900 µm
Automatic yes
Software MX-NT
Warp characteristics Gravity-corrected

WHICH TOOL
fits my needs?

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Peter Michel

+49 (0)721 83118-17
sales(at)eh-metrology.com

 

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