MX 302

Contactless wafer thickness profile measuring instrument for 150 mm and 200 mm silicon wafers.

The MX 302 measures a high resolution thickness scan. Prepared for integration into an automated etching system. Automatic measuring of wafers in the carrier.


Measurement types

Thickness Flatness (TTV)

Features

Wafer Diameter 150 mm, 200 mm
Thickness accurancy ±0.5 µm
Resolution 0.1 µm
Thickness range up to 3
Software VirtualDevice
Dynamic range customized

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Peter Michel

+49 (0)721 83118-17
sales(at)eh-metrology.com

 

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