MX 7012
High resolution thickness and surface profiler for etched 300 mm silicon wafers
Contactless wafer thickness profile measuring instrument for 150 mm and 200 mm silicon wafers.
The MX 302 measures a high resolution thickness scan. Prepared for integration into an automated etching system. Automatic measuring of wafers in the carrier.
| Wafer Diameter | 150 mm, 200 mm |
| Thickness accurancy | ±0.5 µm |
| Resolution | 0.1 µm |
| Thickness range | up to 3 |
| Software | VirtualDevice |
| Dynamic range | customized |
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