MX 1012

High-resolution thickness and flatness (TTV) gauge for 200–300 mm silicon wafers.

Easy adaption to different thickness ranges within a few seconds. Integration into automatic robotic sorter systems possible. The MX1012 is ideally suited for research & development, qualification of processes, and process control of thickness and flatness (TTV) especially after grinding and lapping. A pair of capacitive sensors samples four radial profiles (45 degrees) on every wafer which consist of hundreds of local thickness values. If necessary for your application, the four standard scans can be simply increased to reach an even higher measuring coverage. Comes with our powerful MX-NT operating software.


Measurement types

Thickness Flatness (TTV)

Features

Wafer Diameter 200 mm, 300 mm
Thickness accurancy ±0.4 µm
Resolution 10 nm
Spatial resolution 1 mm
Scans up to 8
Software MX-NT

Product comparison

Feature MX 1012 MX 102-6 MX 102-8 MX 1018
Wafer Diameter 200 mm, 300 mm 100 mm, 125 mm, 150 mm 150 mm, 200 mm 450 mm
Software MX-NT MX-NT MX-NT MX-NT
Scans up to 8 4 4 up to 8
Spatial resolution 1 mm 1 mm 1 mm 1 mm
Resolution 10 nm 10 nm 10 nm 10 nm
Thickness accurancy ±0.4 µm ±0.4 µm ±0.4 µm ±0.3 µm

WHICH TOOL
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Peter Michel

+49 (0)721 83118-17
sales(at)eh-metrology.com

 

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